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ELECTRON-BEAM FACILITY TSEFEY FOR POWER-INTENSIVE VACUUM TECHNOLOGIES AND TESTING

The TSEFEY stand is intended to generate high thermal fluxes produced by the accelerated electron beam, which can be applied to various objects in high vacuum.

ELECTRON-BEAM FACILITY TSEFEY
ELECTRON-BEAM FACILITY TSEFEY

Applications:

  • testing of energy-loaded components;
  • vacuum melting of materials, production of joints by casting;
  • deposition of coatings by thermal evaporation accompanied with electron or ion treatment;
  • vacuum technological processes requiring fast heating and cooling.

Distinguishing features:

  • compatibility with beryllium
  • compatibility with liquid metals;
  • availability of liquid-metal (Na-K) cooling loop.

Equipment used for beam and object diagnostics:

  • videocamera;
  • infrared camera;
  • optical pyrometers;
  • thermocouples;
  • pressure (water/vacuum) pickups;
  • mass-spectrometer of residual gases;
  • computer recording and processing of data.

Technical characteristics:Numerical values
Maximum power in beam:, kW 100
Electron energy:, keV 20-30
Maximum flux density:, MWt/m² 400
Loading duration:, sec 0.001 - inf.
Maximum size of irradiation field in raster:, mm² 40x400
Scanning frequency:, Hz 1000
High-vacuum chamber volume:, m³ 3
Background pressure:, Torr 10-6
Water cooling system parameters:  
Pressure, Pa 16
Speed of flow, l/s 1.5
Temperature , °C 10-80

 
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