VACUUM ARC COATING FACILITY (VACF)
The vacuum arc coating facility is intended for deposition of functional (wear-resistant, anti-corrosive, heat-resistant, anti-friction, anti-emission, protective, etc.) coatings on large-size products (tubes, sheets, antennas, etc.). The facility provides vacuum pumping, heating and finishing ion cleaning of deposited products, production of gas medium required for technological deposition processes, deposition of coatings on three types of products:
– tubes 1 m - 3 m in length, 10 - 60 mm in diameter, with a maximum loading of 40 pieces; ¬
– sheets 2 m x 1 m in dimensions, with a maximum loading of 5 pieces; ¬
– antennas up to 2 m in diameter.
Technical characteristics | |
Vacuum chamber (stainless steel, water-cooled): | |
inner diameter, mm | 2400 |
inner length, mm | 4400 |
Vacuum pumping (by cryosorption pumps): | |
Vacuum Arc Coating Facility (VACF) | 5x10-4 |
pumping time till ultimate residual pressure, h | 1 |
In-chamber heating of products (with controllable temperature): | |
maximum power, kW | 55 |
maximum temperature of products heating, пїЅC | 400 |
Technological gas supply system: | |
(four channels) ,cm3/min | 0-1000 |
Mechanisms of in-chamber products displacement: | |
holder for tubes (up to 3 m in length and 60 mm in diameter) ensuring in-chamber planetary displacement, | |
holder for sheets (up to 2 m in length and 1 m in width) ensuring in-chamber rotation | |
holder for antennas (up to 2 m in diameter) ensuring in-chamber rotation. | |
System of ion cleaning sources: 11 ion cleaning sources with possibility to control ion current and accelerating voltage | |
ion current beam, mA | 150 ± 30 |
operating accelerating voltage, kV | 1 - 4 |
System of electric-arc sources of metallic plasma (11 electric-arc sources with possibility to regulate arc current and plasma flow distribution): | |
operating current, A | 40 - 130 |
operating voltage, V | 25 - 35 |
Source of pulse bias voltage applied to product: | |
pulse voltage, V | 0 - 1000 |
pulse current, A | 0 - 70 |
pulse repetition rate, Hz | 25 - 25000 |
pulse duty factor, % | 5 - 50 |
Common power supply and control system: | |
program-logical control of vacuum pumping, operation of ion | |
and arc sources | |
possible computer control over facility | |
maximum consumed power, kW | 150 |
maximum water consumption, m3 /h | 6,2 |
Publications:
1. V.V. Ivanov, D.A. Karpov, V.A. Krilov et al., Vacuum arc coatings facility VACF (development, manufacturing, experiments). Voprosi atomnoy nauki i tehniki, 2005, series: Eletrofizicheskaya apparatura, issue 3 (29), pp.116-125 (in Russian).
Deliveries:
Product | Delivery year | Customer | Country |
Vacuum Arc Coating Facility (VACF) | 2004 | Chinese Precision Machinery Import and Export | China |